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AJ Bubendorfer, B Ingham, JV Kennedy and WM Arnold
Abstract
By use of synchrotron X-ray fluorescence and Rutherford backscattering spectrometry, we show the SU-8 soft lithographic process contaminates PDMS. Residues of the antimony containing photoinitiator are transferred from the master mold to the surface of PDMS, uncontrollably intensifying the surface potential, leading to electroosmotic flow variability in PDMS microfluidic devices.
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Concepts
Electroosmotic flow, Lithography, Mold, Auger electron spectroscopy, Fluid dynamics, Electron, Spectroscopy, Microfluidics
MeSH headings
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